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Nanolace SIGNED

Mask Based Lithography for Fast, Large Scale Pattern Generation with Nanometer Resolution

Total Cost €

EC-Contrib. €

Partnership

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Nanolace project word cloud

Explore the words cloud of the Nanolace project. It provides you a very rough idea of what is the project "Nanolace" about.

demonstration highest solid electron photons coated obtain reductions blur medical photolithography replicated classes euv patterning positioning quantum generation determined mask industrial mems single secondary breakthrough condensate first condensated resolution extreme smart microelectronics surfaces substrate ultimate resist creation performance violet onto 92 individual masks materials technique huge nano pattern limit membranes lithography room 20 direct einstein radical atoms metastable optical bose nm exacerbating demonstrated fast ranging ultra beam filtration molecules temperature transfer imaging refers that photon projected electronic todays uses ev nanolace patterns metamaterials techniques energy push moment

Project "Nanolace" data sheet

The following table provides information about the project.

Coordinator	UNIVERSITETET I BERGEN Organization address address: MUSEPLASSEN 1 city: BERGEN postcode: 5020 website: www.uib.no contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.
Coordinator Country	Norway [NO]
Total cost	3˙356˙511 €
EC max contribution	3˙356˙511 € (100%)
Programme	1. H2020-EU.1.2.1. (FET Open)
Code Call	H2020-FETOPEN-2018-2019-2020-01
Funding Scheme	RIA
Starting year	2020
Duration (year-month-day)	from 2020-01-01 to 2023-12-31

Partnership

Take a look of project's partnership.

#	participants	country	role	EC contrib. [€]
1	UNIVERSITETET I BERGEN UNIVERSITETET I BERGEN Organization address address: MUSEPLASSEN 1 city: BERGEN postcode: 5020 website: www.uib.no contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	NO (BERGEN)	coordinator	537˙686.00
2	IDRYMA TECHNOLOGIAS KAI EREVNAS IDRYMA TECHNOLOGIAS KAI EREVNAS Organization address address: N PLASTIRA STR 100 city: IRAKLEIO postcode: 70013 website: www.forth.gr contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	EL (IRAKLEIO)	participant	899˙125.00
3	THE UNIVERSITY OF BIRMINGHAM THE UNIVERSITY OF BIRMINGHAM Organization address address: Edgbaston city: BIRMINGHAM postcode: B15 2TT website: www.bham.ac.uk contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	UK (BIRMINGHAM)	participant	481˙413.00
4	MB SCIENTIFIC AB MB SCIENTIFIC AB Organization address address: FALHAGSLEDEN, 61 city: UPPSALA postcode: 753 23 website: www.mbscientific.se contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	SE (UPPSALA)	participant	445˙750.00
5	THE PROVOST, FELLOWS, FOUNDATION SCHOLARS & THE OTHER MEMBERS OF BOARD OF THE COLLEGE OF THE HOLY & UNDIVIDED TRINITY OF QUEEN ELIZABETH NEAR DUBLIN THE PROVOST, FELLOWS, FOUNDATION SCHOLARS & THE OTHER MEMBERS OF BOARD OF THE COLLEGE OF THE HOLY & UNDIVIDED TRINITY OF QUEEN ELIZABETH NEAR DUBLIN Organization address address: College Green city: DUBLIN postcode: 2 website: www.tcd.ie contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	IE (DUBLIN)	participant	445˙567.00
6	NORGES TEKNISK-NATURVITENSKAPELIGE UNIVERSITET NTNU NORGES TEKNISK-NATURVITENSKAPELIGE UNIVERSITET NTNU Organization address address: HOGSKOLERINGEN 1 city: TRONDHEIM postcode: 7491 website: www.ntnu.no contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	NO (TRONDHEIM)	participant	393˙953.00
7	IRRESISTIBLE MATERIALS LTD IRRESISTIBLE MATERIALS LTD Organization address address: LANGDON HOUSE LANGDON ROAD city: SWANSEA postcode: SA1 8QY website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	UK (SWANSEA)	participant	153˙016.00

Map

Project objective

Lithography refers to the transfer of a pattern onto a substrate. Lithography techniques are used in the production of a huge range of devices and materials ranging from microelectronics and MEMS devices to optical metamaterials and smart surfaces for medical and other applications. The ultimate goal and limit of lithography is to obtain fast and large scale patterning which enables the controlled positioning of individual molecules or atoms. This requires fast, large scale single nm resolution patterning. At the moment no techniques are available that can do that. Fast positioning of individual molecules or atoms over large areas can path the way for the creation and industrial application of whole new classes of materials and devices including room temperature quantum electronic devices, electronic metamaterials as well as nano filtration membranes and can push the performance of todays microelectronics. The highest resolution (~20 nm), fast, large scale lithography technique today is photolithography where a photon beam is projected through a mask, so that the pattern from the mask is replicated by direct imaging on a substrate coated with resist. Next generation Extreme Ultra Violet (EUV) lithography uses 92 eV photons and is targeted to deliver 8 nm resolution. The EUV ultimate limit, determined by the secondary electron generation blur, is estimated to be around 6 nm, which does not enable single nm resolution patterning. Further reductions in the photolithography resolution of the patterning would increase the photon energy, exacerbating the secondary blur. In Nanolace, a radical breakthrough to reach nm resolution lithography will be demonstrated: single nm resolution patterns will be generated with solid state and optical masks, proposed by partners in the consortium using metastable and Bose Einstein condensated atoms. Nanolace will be the first demonstration of lithography with a Bose Einstein condensate.

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The information about "NANOLACE" are provided by the European Opendata Portal: CORDIS opendata.