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GLISS SIGNED

Gliding epitaxy for inorganic space-power sheets

Total Cost €

0

EC-Contrib. €

0

Partnership

0

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 GLISS project word cloud

Explore the words cloud of the GLISS project. It provides you a very rough idea of what is the project "GLISS" about.

electronic    architecture    economically    tolerance    epitaxially    suggesting    selective    satellite    exhibits    efficient    innovation    designed    mechanical    services    lightweight    wafer    ranging    operation    decreased    free    substrates    nucleates    reuse    energy    expensive    engineering    extraction    lt    pv    limited    flexible    device    bonding    pristine    nanophotonic    release    prospect    structures    grown    hot    current    sustainable    accelerate    equilibrium    rigid    fundamental    deposited    carriers    coverglass    protective    generation    carrier    film    rebalance    crystal    enhancement    unlimited    glide    technologies    multijunction    steady    demonstrated    underlying    2d    structure    ultra    films    registry    modern    launch    afforded    heavy    prevent    photovoltaic    radiation    damage    provides    provision    efficiency    substrate    global    power    nm    thin    thick    realizing    universal    surface    form    panels    intrinsic    drive    fabrication    layer    removing    scalable    interface    rates    despite    translational    epitaxial    monolayers    restrictions    geometry    interaction   

Project "GLISS" data sheet

The following table provides information about the project.

Coordinator
THE CHANCELLOR MASTERS AND SCHOLARSOF THE UNIVERSITY OF CAMBRIDGE 

Organization address
address: TRINITY LANE THE OLD SCHOOLS
city: CAMBRIDGE
postcode: CB2 1TN
website: www.cam.ac.uk

contact info
title: n.a.
name: n.a.
surname: n.a.
function: n.a.
email: n.a.
telephone: n.a.
fax: n.a.

 Coordinator Country United Kingdom [UK]
 Total cost 1˙797˙789 €
 EC max contribution 1˙797˙789 € (100%)
 Programme 1. H2020-EU.1.1. (EXCELLENT SCIENCE - European Research Council (ERC))
 Code Call ERC-2019-STG
 Funding Scheme ERC-STG
 Starting year 2020
 Duration (year-month-day) from 2020-01-01   to  2024-12-31

 Partnership

Take a look of project's partnership.

# participants  country  role  EC contrib. [€] 
1    THE CHANCELLOR MASTERS AND SCHOLARSOF THE UNIVERSITY OF CAMBRIDGE UK (CAMBRIDGE) coordinator 1˙797˙789.00

Map

 Project objective

Current satellite technologies are limited by the photovoltaic (PV) panels they require for power generation. Despite steady advances in efficiency afforded by modern III-V multijunction PV, these large, rigid panels are expensive to produce and launch due to their heavy on-wafer architecture and thick protective coverglass, which is necessary to prevent radiation damage. I will develop and demonstrate ultra-thin (<100 nm) III-V PV, for highly efficient, lightweight, and flexible satellite PV provision. Decreased costs will help accelerate universal availability of satellite services, essential for sustainable global development, and removing PV form factor restrictions will drive innovation in satellite design.

Realizing this goal will require a translational program of research, ranging from fundamental design parameters to scalable fabrication methodologies. I recently demonstrated that the ultra-thin form factor exhibits intrinsic radiation tolerance, suggesting the prospect of a coverglass free, flexible system. I will target high efficiency in this geometry by engineering the device architecture to rebalance carrier interaction rates to support generation of non-equilibrium hot-carriers through the use of nanophotonic structures for strong E-field enhancement. The electronic structure will be designed for energy selective hot-carrier extraction, allowing highly efficient operation. Scalable fabrication will be achieved via development of a novel crystal growth method, in which III-V films are grown epitaxially on 2D monolayers. The 2D interface will prevent strong bonding between the deposited layer and an underlying growth substrate, which provides registry information to the crystal as it nucleates. The epitaxial layer will be free to glide across the growth surface during film formation, allowing the mechanical release of pristine films and the unlimited reuse of the growth substrates, enabling scalable, economically viable production of this new device.

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The information about "GLISS" are provided by the European Opendata Portal: CORDIS opendata.

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