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GLISS SIGNED

Gliding epitaxy for inorganic space-power sheets

Total Cost €

0

EC-Contrib. €

0

Partnership

0

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 GLISS project word cloud

Explore the words cloud of the GLISS project. It provides you a very rough idea of what is the project "GLISS" about.

carriers    operation    rates    device    photovoltaic    economically    selective    protective    equilibrium    tolerance    accelerate    unlimited    substrate    current    films    nm    prevent    panels    wafer    power    launch    multijunction    nucleates    grown    removing    structures    nanophotonic    geometry    technologies    thin    generation    release    exhibits    lt    engineering    intrinsic    carrier    designed    ranging    afforded    underlying    lightweight    layer    form    extraction    universal    epitaxially    scalable    restrictions    surface    hot    architecture    provision    electronic    translational    innovation    free    rebalance    realizing    enhancement    energy    structure    provides    rigid    registry    satellite    services    thick    expensive    sustainable    limited    film    damage    pv    interaction    deposited    demonstrated    ultra    crystal    efficient    2d    global    bonding    substrates    mechanical    epitaxial    steady    pristine    despite    glide    monolayers    suggesting    radiation    efficiency    fabrication    decreased    coverglass    flexible    prospect    reuse    fundamental    modern    drive    heavy    interface   

Project "GLISS" data sheet

The following table provides information about the project.

Coordinator
THE CHANCELLOR MASTERS AND SCHOLARSOF THE UNIVERSITY OF CAMBRIDGE 

Organization address
address: TRINITY LANE THE OLD SCHOOLS
city: CAMBRIDGE
postcode: CB2 1TN
website: www.cam.ac.uk

contact info
title: n.a.
name: n.a.
surname: n.a.
function: n.a.
email: n.a.
telephone: n.a.
fax: n.a.

 Coordinator Country United Kingdom [UK]
 Total cost 1˙797˙789 €
 EC max contribution 1˙797˙789 € (100%)
 Programme 1. H2020-EU.1.1. (EXCELLENT SCIENCE - European Research Council (ERC))
 Code Call ERC-2019-STG
 Funding Scheme ERC-STG
 Starting year 2020
 Duration (year-month-day) from 2020-01-01   to  2024-12-31

 Partnership

Take a look of project's partnership.

# participants  country  role  EC contrib. [€] 
1    THE CHANCELLOR MASTERS AND SCHOLARSOF THE UNIVERSITY OF CAMBRIDGE UK (CAMBRIDGE) coordinator 1˙797˙789.00

Map

 Project objective

Current satellite technologies are limited by the photovoltaic (PV) panels they require for power generation. Despite steady advances in efficiency afforded by modern III-V multijunction PV, these large, rigid panels are expensive to produce and launch due to their heavy on-wafer architecture and thick protective coverglass, which is necessary to prevent radiation damage. I will develop and demonstrate ultra-thin (<100 nm) III-V PV, for highly efficient, lightweight, and flexible satellite PV provision. Decreased costs will help accelerate universal availability of satellite services, essential for sustainable global development, and removing PV form factor restrictions will drive innovation in satellite design.

Realizing this goal will require a translational program of research, ranging from fundamental design parameters to scalable fabrication methodologies. I recently demonstrated that the ultra-thin form factor exhibits intrinsic radiation tolerance, suggesting the prospect of a coverglass free, flexible system. I will target high efficiency in this geometry by engineering the device architecture to rebalance carrier interaction rates to support generation of non-equilibrium hot-carriers through the use of nanophotonic structures for strong E-field enhancement. The electronic structure will be designed for energy selective hot-carrier extraction, allowing highly efficient operation. Scalable fabrication will be achieved via development of a novel crystal growth method, in which III-V films are grown epitaxially on 2D monolayers. The 2D interface will prevent strong bonding between the deposited layer and an underlying growth substrate, which provides registry information to the crystal as it nucleates. The epitaxial layer will be free to glide across the growth surface during film formation, allowing the mechanical release of pristine films and the unlimited reuse of the growth substrates, enabling scalable, economically viable production of this new device.

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The information about "GLISS" are provided by the European Opendata Portal: CORDIS opendata.

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