NANOMEND
"Nanoscale Defect Detection, Cleaning and Repair for Large Area Substrates"
| Coordinatore | THE UNIVERSITY OF HUDDERSFIELD
Organization address
address: Queensgate contact info |
| Nazionalità Coordinatore | United Kingdom [UK] |
| Totale costo | 10˙357˙516 € |
| EC contributo | 7˙250˙000 € |
| Programma | FP7-NMP
Specific Programme "Cooperation": Nanosciences, Nanotechnologies, Materials and new Production Technologies |
| Code Call | FP7-NMP-2011-LARGE-5 |
| Funding Scheme | CP-IP |
| Anno di inizio | 2012 |
| Periodo (anno-mese-giorno) | 2012-01-01 - 2015-12-31 |
Partecipanti
| # | ||||
|---|---|---|---|---|
| 1 |
THE UNIVERSITY OF HUDDERSFIELD
Organization address
address: Queensgate contact info |
UK (HUDDERSFIELD) | coordinator | 931˙112.02 |
| 2 |
Centre for Process Innovation Limited
Organization address
address: "Wilton Centre, Wilton" contact info |
UK (Redcar) | participant | 1˙350˙788.50 |
| 3 |
ISRA VISION AG
Organization address
address: INDUSTRIESTRASSE 14 contact info |
DE (DARMSTADT) | participant | 725˙716.50 |
| 4 |
LAPPEENRANNAN TEKNILLINEN YLIOPISTO
Organization address
address: Skinnarilankatu 34 contact info |
FI (LAPPEENRANTA) | participant | 625˙250.00 |
| 5 |
TTY-SAATIO
Organization address
address: Korkeakoulunkatu 10 contact info |
FI (TAMPERE) | participant | 566˙936.40 |
| 6 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V
Organization address
address: Hansastrasse 27C contact info |
DE (MUENCHEN) | participant | 539˙987.00 |
| 7 |
NPL MANAGEMENT LIMITED
Organization address
address: SERCO HOUSE 16 BARTLEY WOOD - BUSINESS PARK BARTLEY WAY 16 contact info |
UK (HOOK - HAMPSHIRE) | participant | 510˙710.50 |
| 8 |
FLISOM AG
Organization address
address: Ueberlandstrasse 129 contact info |
CH (DUBENDORF) | participant | 489˙687.50 |
| 9 |
IBS PRECISION ENGINEERING BV
Organization address
address: Esp 201 contact info |
NL (EINDHOVEN) | participant | 484˙329.50 |
| 10 |
NEDERLANDSE ORGANISATIE VOOR TOEGEPAST NATUURWETENSCHAPPELIJK ONDERZOEK TNO
Organization address
address: Schoemakerstraat 97 contact info |
NL (DEN HAAG) | participant | 434˙642.25 |
| 11 |
Kite Innovation (Europe) Limited
Organization address
address: 3M BUCKLEY INNOVATION CENTRE BIC 2/01 contact info |
UK (HUDDERSFIELD) | participant | 264˙120.00 |
| 12 |
ISOVOLTAIC AG
Organization address
address: ISOVOLTAICSTRASSE 1 contact info |
AT (LEBRING) | participant | 146˙840.00 |
| 13 |
ISCENT OY
Organization address
address: LAPINNIEMENRANTA 12 A 23 contact info |
FI (TAMPERE) | participant | 105˙337.50 |
| 14 |
MICROSHARP CORPORATION LIMITED
Organization address
address: SHRIVENHAM HUNDRED 52 WATCHFIELD contact info |
UK (SWINDON) | participant | 51˙542.33 |
| 15 |
STORA ENSO OYJ
Organization address
address: KANAVARANTA 1 contact info |
FI (HELSINKI) | participant | 23˙000.00 |
Mappa
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Obiettivo del progetto (Objective)
'NanoMend will pioneer efforts to develop better, more integrated process inspection, cleaning, repair and control systems for nano-scale thin films on large area foils, and will do so in two exemplar vertical supply chains for functionalized polymer-coated paper products and for low cost flexible photovoltaics (PV). The aim is to demonstrate beyond state-of-the-art in-line detection, cleaning and repair of micro and nano-scale defects. The NanoMend strategy to develop novel optical inspection methods has three strands: 1.Enhance the effective lateral resolution and the vertical resolution of high speed optical inspection systems currently used to scan large area foils. 2. Develop high precision optical interferometric sensors with significantly higher spatial range and scan speed than existing laboratory interferometers. 3.Build and test prototype optical interferometers that can detect defects which have a spatial size below the diffraction limit (down to approximately 10nm) by utilizing a priori knowledge of the geometry of the defects and inverse modeling approaches. The NanoMend strategy for cleaning is to decrease defect density and enhance yield by using directional cleaning methods optimized for i) continuous operation to remove sub-micron defects from large area foils prior to barrier deposition, and ii) local removal of particles generated during fabrication of PV modules. Local repair techniques will be investigated in particular for interconnection defects detected near the end of PV module manufacture where the value of the work to be recovered is very high. NanoMend solutions proposed for inspection, cleaning and repair will be integrated into a) production of large-area photovoltaic panels for use in building-integrated systems with demonstrable long life (15-20 years) and b) production of polymer-coated papers used in fibre-based packaging solutions.'
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