SNM
Single Nanometer Manufacturing for beyond CMOS devices
| Coordinatore | TECHNISCHE UNIVERSITAET ILMENAU
Organization address
address: EHRENBERGSTRASSE 29 contact info |
| Nazionalità Coordinatore | Germany [DE] |
| Totale costo | 17˙804˙198 € |
| EC contributo | 12˙012˙000 € |
| Programma | FP7-ICT
Specific Programme "Cooperation": Information and communication technologies |
| Code Call | FP7-ICT-2011-8 |
| Funding Scheme | CP |
| Anno di inizio | 2013 |
| Periodo (anno-mese-giorno) | 2013-01-01 - 2016-12-31 |
Partecipanti
| # | ||||
|---|---|---|---|---|
| 1 |
TECHNISCHE UNIVERSITAET ILMENAU
Organization address
address: EHRENBERGSTRASSE 29 contact info |
DE (ILMENAU) | coordinator | 0.00 |
| 2 |
AGENCIA ESTATAL CONSEJO SUPERIOR DE INVESTIGACIONES CIENTIFICAS
Organization address
address: CALLE SERRANO 117 contact info |
ES (MADRID) | participant | 0.00 |
| 3 |
ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE
Organization address
address: BATIMENT CE 3316 STATION 1 contact info |
CH (LAUSANNE) | participant | 0.00 |
| 4 |
EV GROUP E. THALLNER GMBH
Organization address
address: DI ERICH THALLNER STRASSE 1 contact info |
AT (ST. FLORIAN AM INN) | participant | 0.00 |
| 5 |
IBM RESEARCH GMBH
Organization address
address: SAEUMERSTRASSE 4 contact info |
CH (RUESCHLIKON) | participant | 0.00 |
| 6 |
IMPERIAL COLLEGE OF SCIENCE, TECHNOLOGY AND MEDICINE
Organization address
address: Exhibition Road, South Kensington Campus contact info |
UK (LONDON) | participant | 0.00 |
| 7 |
INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM VZW
Organization address
address: Kapeldreef 75 contact info |
BE (LEUVEN) | participant | 0.00 |
| 8 |
MICROSYSTEMS LTD
Organization address
address: kv. CHAIKA 15-D-21 contact info |
BG (Varna) | participant | 0.00 |
| 9 |
OXFORD INSTRUMENTS NANOTECHNOLOGY TOOLS LIMITED
Organization address
address: TUBNEY WOODS contact info |
UK (ABINGDON) | participant | 0.00 |
| 10 |
OXFORD SCIENTIFIC CONSULTANTS LTD
Organization address
address: ST PETERS ROAD 8A contact info |
UK (ABINGDON) | participant | 0.00 |
| 11 |
SWISSLITHO AG
Organization address
address: TECHNOPARKSTRASSE 1 contact info |
CH (ZURICH) | participant | 0.00 |
| 12 |
TECHNISCHE UNIVERSITEIT DELFT
Organization address
address: Stevinweg 1 contact info |
NL (DELFT) | participant | 0.00 |
| 13 |
THE OPEN UNIVERSITY
Organization address
address: WALTON HALL contact info |
UK (MILTON KEYNES) | participant | 0.00 |
| 14 |
THE UNIVERSITY OF LIVERPOOL
Organization address
address: BROWNLOW HILL 765 FOUNDATION BUILDING contact info |
UK (LIVERPOOL) | participant | 0.00 |
| 15 |
UNIVERSITAET BAYREUTH
Organization address
address: UNIVERSITATSSTRASSE 30 contact info |
DE (BAYREUTH) | participant | 0.00 |
| 16 |
VSL B.V.
Organization address
address: THIJSSEWEG 11 contact info |
NL (DELFT) | participant | 0.00 |
Mappa
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Obiettivo del progetto (Objective)
To extend beyond existing limits in nanodevice fabrication, new and unconventional lithographic technologies are necessary to reach Single Nanometer Manufacturing (SNM) for novel 'Beyond CMOS devices'. Two approaches are considered: scanning probe lithography (SPL) and focused electron beam induced processing (FEBIP). Our project tackles this challenge by employing SPL and FEBIP with novel small molecule resist materials. The goal is to work from slow direct-write methods to high speed step-and-repeat manufacturing by Nano Imprint Lithography (NIL), developing methods for precise generation, placement, metrology and integration of functional features at 3 - 5 nm by direct write and sub-10nm into a NIL-template. The project will first produce a SPL-tool prototype and will then develop and demonstrate an integrated process flow to establish proof-of-concept 'Beyond CMOS devices' employing developments in industrial manufacturing processes (NIL, plasma etching) and new materials (Graphene, MoS2). By the end of the project: (a) SNM technology will be used to demonstrate novel room temperature single electron and quantum effect devices; (b) a SNM technology platform will be demonstrated, showing an integrated process flow, based on SPL prototype tools, electron beam induced processing, and finally pattern transfer at industrial partner sites. An interdisciplinary team (7 Industry and 8 Research/University partners) from experienced scientists will be established to cover specific fields of expertise: chemical synthesis, scanning probe lithography, FEBIP-Litho, sub-3nm design and device fabrication, single nanometer etching, and Step-and-Repeat NIL- and novel alignment system design. The project coordinator is a University with great experience in nanostructuring and European project management where the executive board includes European industry leaders such as IBM, IMEC, EVG, and Oxford Instruments.