Explore the words cloud of the TAKEMI5 project. It provides you a very rough idea of what is the project "TAKEMI5" about.
The following table provides information about the project.
Coordinator |
ASML NETHERLANDS B.V.
Organization address contact info |
Coordinator Country | Netherlands [NL] |
Total cost | 132˙778˙302 € |
EC max contribution | 28˙339˙999 € (21%) |
Programme |
1. H2020-EU.2.1.1.7. (ECSEL) |
Code Call | H2020-ECSEL-2016-2-IA-two-stage |
Funding Scheme | ECSEL-IA |
Starting year | 2017 |
Duration (year-month-day) | from 2017-04-01 to 2019-11-30 |
Take a look of project's partnership.
In line with industry needs, Moore’s law, scaling in ITRS 2013/2015, and ECSEL JU MASP 2016, the main objective of the TAKEMI5 project is to discover, develop and demonstrate lithographic, metrology, process and integration technologies enabling module integration for the 5 nm node. This is planned with available EUV/NA0.33 scanners that are optimized for mix and match with existing DUV/NA1.35 scanners, and with system design and development of a new hyper NA EUV lithography tool to enable more single exposure patterning at 5 nm to create complex integrated circuits. Process steps for modules in Front-end, Middle and Back-end of line are discovered and developed using the most advanced tool capabilities and they are evaluated morphologically and electrically using a relaxed test vehicle. During the development, specific challenges in metrology are assessed and metrology tools are upgraded or newly developed. The results are demonstrated in the imec pilot line with qualified metrology tools at the 5 nm node. The TAKEMI5 project relates to the ECSEL work program topic Process technologies – More Moore. It addresses and targets, as set out in the MASP, at a (disruptive) new Semiconductor Process, Equipment and Materials solutions for advanced CMOS processes that enable the module integration of electronic devices for the 5nm node in high-volume manufacturing and fast prototyping. The project touches the core of the continuation of Moore’s law which has celebrated its 50th anniversary. The cost aware development process supports the involved companies, and places them in an enhanced position for their worldwide competition. Through their worldwide affiliations, the impact of the TAKEMI5 project will be felt outside Europe in America and Asia Pacific semiconductor centers and is expected to benefit the European economy a lot by supporting its semiconductor equipment and metrology sectors with innovations, exports and employment.
year | authors and title | journal | last update |
---|---|---|---|
2019 |
Lars Wischmeier Pushing limits of optical lithography: Status and future perspectives of EUVL optics published pages: , ISSN: , DOI: |
\"17th Workshop \"\"Beams and More\"\", Suttgart, 2019\" 2019 | 2020-03-17 |
2019 |
Aliasghar Keyvani, Mehmet S. Tamer, Maarten H. v. Es, Marco v.d.Lans Frequency Modulation Sub-surface Atomic Force Microscopy (poster presentation) published pages: , ISSN: , DOI: |
Semicon Innovation Day 2019 21-05-2019 | 2020-03-17 |
2019 |
Laurent Fillinger, Mehmet S. Tamer, Maarten H. v. Es, Marco v.d.Lans Advanced Processing for Quantitative Sub-surface Data Extraction (poster presentation) published pages: , ISSN: , DOI: |
Semicon Innovation Day 2019 21-05-2019 | 2020-03-17 |
2019 |
Maarten E. v. Reijzen, Mehmet S. Tamer, Maarten H. v. Es, Martijn v. Riel, Tom Duivenvoorde
Aliasghar Keyvani, Hamed Sadeghian, Marco v.d. Lans Sub-surface Imaging with Photo Thermal Actuation(poster presentation) published pages: , ISSN: , DOI: |
Semicon Innovation Day 2019 21-05-2019 | 2020-03-17 |
2019 |
Maarten H. van Es, Laurent Fillinger, Mehmet S. Tamer, Marco van der Lans High Resolution SubSurface Probe Microscopy for node5 applications published pages: , ISSN: , DOI: |
Semicon Innovation Day 2019 21-05-2019 | 2020-03-17 |
2019 |
KateÅ™ina RubeÅ¡ová, Jan HavlÃÄek, VÃt JakeÅ¡, Ladislav Nádherný, Jakub Cajzl, Dalibor Pánek, Tomáš Parkman, Alena Beitlerova, Romana KuÄerková, FrantiÅ¡ek Hájek, Martin Nikl Heavily Ce 3+ -doped Y 3 Al 5 O 12 thin films deposited by a polymer sol–gel method for fast scintillation detectors published pages: 5115-5123, ISSN: 1466-8033, DOI: 10.1039/c9ce00842j |
CrystEngComm 21/34 | 2020-03-17 |
2017 |
Maarten. H. van Es, Martijn van Riel, Tom Duivenvoorde, Hamed Sadeghian Electrostatically actuated probes for Scanning Sub-surface Ultrasonic Resonance Frequency Microscopy published pages: , ISSN: , DOI: |
3rd ERP 3D Nanomanufacturing Dissemination Event Proceedings 06-11-2017 | 2020-03-17 |
2017 |
Maarten. H. van Es, Hamed Sadeghian Frequency Modulation Subsurface Ultrasonic Force Microscopy published pages: , ISSN: , DOI: |
3rd ERP 3D Nanomanufacturing Dissemination Event Proceedings 06-11-2017 | 2020-03-17 |
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