ASIVA14

Analog SImulation and Variability Analysis for 14nm designs

 Coordinatore TECHNISCHE UNIVERSITEIT EINDHOVEN 

 Organization address address: DEN DOLECH 2
city: EINDHOVEN
postcode: 5612 AZ

contact info
Titolo: Mr.
Nome: Patrick
Cognome: Groothuis
Email: send email
Telefono: +31 40 247 5165
Fax: +31 40 243 6685

 Nazionalità Coordinatore Netherlands [NL]
 Totale costo 718˙319 €
 EC contributo 718˙319 €
 Programma FP7-PEOPLE
Specific programme "People" implementing the Seventh Framework Programme of the European Community for research, technological development and demonstration activities (2007 to 2013)
 Code Call FP7-PEOPLE-2013-ITN
 Funding Scheme MC-ITN
 Anno di inizio 2013
 Periodo (anno-mese-giorno) 2013-09-01   -   2017-08-31

 Partecipanti

# participant  country  role  EC contrib. [€] 
1    TECHNISCHE UNIVERSITEIT EINDHOVEN

 Organization address address: DEN DOLECH 2
city: EINDHOVEN
postcode: 5612 AZ

contact info
Titolo: Mr.
Nome: Patrick
Cognome: Groothuis
Email: send email
Telefono: +31 40 247 5165
Fax: +31 40 243 6685

NL (EINDHOVEN) coordinator 718˙319.56
2    MENTOR GRAPHICS (IRELAND) LTD

 Organization address address: "EAST PARK, SHANNON FREE ZONE"
city: SHANNON

contact info
Titolo: Dr.
Nome: Jean-Marc
Cognome: Talbot
Email: send email
Telefono: +33 476040149
Fax: 33476900724

IE (SHANNON) participant 0.00

Mappa

Leaflet | Map data © OpenStreetMap contributors, CC-BY-SA, Imagery © Mapbox

 Word cloud

Esplora la "nuvola delle parole (Word Cloud) per avere un'idea di massima del progetto.

mathematical    electronics    network    virtual    reality    numerical    transferable    real    industry    techniques    training    skills    world    young    eda   

 Obiettivo del progetto (Objective)

'In recent years the demand of the electronics industry on mathematical methods used in EDA software has witnessed a tremendous growth. “The real world is analog and computers are digital.” These nine words set the stage for the great circuit design challenges of the next decade. To quote G. Dan Hutchenson, president of VLSI Research, “virtual reality is possible only with mixed-signal chips, and of course, every designer on the planet, from the creators of advanced smart phones to cars that nearly drive themselves, is hot on the trail of virtual reality.” Most current EDA methods and the tools that support them are inadequate to the task of designing for the “real world”, for to do so they must account for an enormous number of design considerations. The list is long and daunting for every application and includes process, voltage and temperature (PVT) variation, power consumption, process constraints and yield requirements. Advanced numerical techniques are imperative to address present-day challenges (going to 14 nm!) in the electronics industry. The motivation for this training network is the need for a network of highly educated European scientists in the field of mathematics for the EDA industry and computational science, so as to exchange and discuss current insights and ideas, and to lay groundwork for future collaborations. The challenge lies in the necessity of combining transferable techniques and skills such as mathematical analysis, sophisticated numerical methods and stochastic simulation methods with deep qualitative and quantitative understanding of mathematical models arising from problems in the electronics and EDA industry. The main training objective is to prepare, at the highest possible level, young researchers with a broad scope of scientific knowledge and to teach transferable skills. The two partners in the project combine decades of knowledge on EDA problems, and as such are an ideal basis for the hosting of the young ESRs to be trained.'

Altri progetti dello stesso programma (FP7-PEOPLE)

ANOCAP (2013)

COMPARATIVE EVOLUTIONARY AND FUNCTIONAL GENOMICS OF DISEASE-VECTOR ANOPHELES MOSQUITOES

Read More  

CB1R ARRESTIN (2011)

Contribution of beta-arrestin-dependent receptor signaling to the physiological regulation of the endocannabinoid system

Read More  

LASERNAMI (2010)

Laser Nanoscale Manufacturing

Read More