COCOON

Conformal coating of nanoporous materials

Coordinatore	UNIVERSITEIT GENT    more Spiacenti, non ci sono informazioni su questo coordinatore. Contattare Fabio per maggiori infomrazioni, grazie.
Nazionalità Coordinatore	Belgium [BE]
Totale costo	1˙432˙799 €
EC contributo	1˙432˙799 €
Programma	FP7-IDEAS-ERC Specific programme: "Ideas" implementing the Seventh Framework Programme of the European Community for research, technological development and demonstration activities (2007 to 2013)
Code Call	ERC-2009-StG
Funding Scheme	ERC-SG
Anno di inizio	2010
Periodo (anno-mese-giorno)	2010-01-01   -   2014-12-31

 Partecipanti

#	participant	country	role	EC contrib. [€]
1	UNIVERSITEIT GENT  Organization address address: SINT PIETERSNIEUWSTRAAT 25 city: GENT postcode: 9000 contact info Titolo: Ms. Nome: Nathalie Cognome: Vandepitte Email: send email Telefono: -2643006 Fax: -2643560	BE (GENT)	hostInstitution	1˙432˙800.00
2	UNIVERSITEIT GENT  Organization address address: SINT PIETERSNIEUWSTRAAT 25 city: GENT postcode: 9000 contact info Titolo: Prof. Nome: Christophe Cognome: Detavernier Email: send email Telefono: -2644331 Fax: -2644973	BE (GENT)	hostInstitution	1˙432˙800.00

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 Obiettivo del progetto (Objective)

'CONTEXT - Nanoporous structures are used for application in catalysis, molecular separation, fuel cells, dye sensitized solar cells etc. Given the near molecular size of the porous network, it is extremely challenging to modify the interior surface of the pores after the nanoporous material has been synthesized.

THIS PROPOSAL - Atomic Layer Deposition (ALD) is envisioned as a novel technique for creating catalytically active sites and for controlling the pore size distribution in nanoporous materials. ALD is a self-limited growth method that is characterized by alternating exposure of the growing film to precursor vapours, resulting in the sequential deposition of (sub)monolayers. It provides atomic level control of thickness and composition, and is currently used in micro-electronics to grow films into structures with aspect ratios of up to 100 / 1. We aim to make the fundamental breakthroughs necessary to enable atomic layer deposition to engineer the composition, size and shape of the interior surface of nanoporous materials with aspect ratios in excess of 10,000 / 1.

POTENTIAL IMPACT Achieving these objectives will enable atomic level engineering of the interior surface of any porous material. We plan to focus on three specific applications where our results will have both medium and long term impacts:

- Engineering the composition of pore walls using ALD, e.g. to create catalytic sites (e.g. Al for acid sites, Ti for redox sites, or Pt, Pd or Ni)

- chemical functionalization of the pore walls with atomic level control can result in breakthrough applications in the fields of catalysis and sensors.

- Atomic level control of the size of nanopores through ALD controlling the pore size distribution of molecular sieves can potentially lead to breakthrough applications in molecular separation and filtration.

- Nanocasting replication of a mesoporous template by means of ALD can result in the mass-scale production of nanotubes.'