Coordinatore | ASM INTERNATIONAL N.V.
Organization address
address: Versterkerstraat 8 contact info |
Nazionalità Coordinatore | Netherlands [NL] |
Totale costo | 1˙240˙586 € |
EC contributo | 998˙550 € |
Programma | FP7-ICT
Specific Programme "Cooperation": Information and communication technologies |
Code Call | FP7-ICT-2011-8 |
Funding Scheme | CSA |
Anno di inizio | 2012 |
Periodo (anno-mese-giorno) | 2012-11-01 - 2015-10-31 |
# | ||||
---|---|---|---|---|
1 |
ASM INTERNATIONAL N.V.
Organization address
address: Versterkerstraat 8 contact info |
NL (Almere) | coordinator | 0.00 |
2 |
APPLIED MATERIALS ISRAEL LTD
Organization address
address: OPPENHEIMER contact info |
IL (REHOVOT) | participant | 0.00 |
3 |
ASML NETHERLANDS B.V.
Organization address
address: DE RUN 6501 contact info |
NL (VELDHOVEN) | participant | 0.00 |
4 |
COMMISSARIAT A L ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
Organization address
address: RUE LEBLANC contact info |
FR (PARIS 15) | participant | 0.00 |
5 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V
Organization address
address: Hansastrasse contact info |
DE (MUNCHEN) | participant | 0.00 |
6 |
FUTURE HORIZONS LTD
Organization address
address: BETHEL ROAD contact info |
UK (SEVENOAKS) | participant | 0.00 |
7 |
INTEL RESEARCH AND INNOVATION IRELAND LIMITED
Organization address
address: Collinstown Industrial Park contact info |
IE (LEIXLIP, CO KILDARE) | participant | 0.00 |
8 |
INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM VZW
Organization address
address: Kapeldreef contact info |
BE (LEUVEN) | participant | 0.00 |
9 |
RECIF TECHNOLOGIES
Organization address
address: rue des briquetiers contact info |
FR (Blagnac) | participant | 0.00 |
10 |
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES SA
Organization address
address: CHEMIN DES FRANQUES - PARC TECHNOLOGIQUE DES FONTAINES contact info |
FR (BERNIN) | participant | 0.00 |
11 |
SEMI EUROPE-GRENOBLE OFFICE
Organization address
city: GRENOBLE contact info |
FR (GRENOBLE) | participant | 0.00 |
Esplora la "nuvola delle parole (Word Cloud) per avere un'idea di massima del progetto.
5 major global semiconductor companies Intel, Samsung, TSMC, IBM and Global Foundries, have decided to work closely together to bring 450 mm semiconductor processing to a mature level, within a consortium called G450C. This operation, based in Albany N.Y., is currently ordering and installing the first wave of 450 mm systems. The major drivers of this effort are Intel and TSMC, which have provided roadmaps towards full 450 mm production. European semiconductor Equipment & Materials (E&M) companies have decided that to secure their global activities, being the major part of their business, they should take an active part in these developments. Therefore in 2009 a European E&M 450 mm initiative was established: EEMI450, to bring the European interested E&M companies and institutes together and to initiate activities in this innovative direction. This Coordination Action will support the activities of this initiative and further 450 mm activities in Europe, for instance the establishment of a 450 mm pilotline. Strong links to existing 450 mm funded projects: ENIAC EEMI450, Catrene SOI450 and NGC450 plus ENIAC EEM450PR are required. Inputs from the recent EU funded study SMART2010/0062, concerning 450 mm production in Europe, have to be taken into account. Much importance will also be attached to tighten the link to global activities and expertise, especially of course with G450C in Albany. Intensive contact with the driving semiconductor companies is key part of the project; one of them, Intel Ireland, is a consortium member. An Advisory Board seated with accepted experts in the field will supervise and guide the European applicability of the solutions. In addition related Standards will receive special attention. The dominating aspect of this Coordination Action is of course dissemination and instruments like studies, workshops, a dedicated website and seminars will be used to provide an effective network and basis for European 450 mm E&M developments.