PHOTOPATTTOCELL

Photopatterning of Cellulose Films for Creation of 2- and 3-Dimensional Nanostructures

 Coordinatore TECHNISCHE UNIVERSITAET GRAZ 

 Organization address address: Rechbauerstrasse 12
city: GRAZ
postcode: 8010

contact info
Titolo: Mr.
Nome: Gerald
Cognome: Pichler
Email: send email
Telefono: 433169000000

 Nazionalità Coordinatore Austria [AT]
 Totale costo 75˙000 €
 EC contributo 75˙000 €
 Programma FP7-PEOPLE
Specific programme "People" implementing the Seventh Framework Programme of the European Community for research, technological development and demonstration activities (2007 to 2013)
 Code Call FP7-PEOPLE-2013-CIG
 Funding Scheme MC-CIG
 Anno di inizio 2013
 Periodo (anno-mese-giorno) 2013-09-01   -   2016-08-31

 Partecipanti

# participant  country  role  EC contrib. [€] 
1    TECHNISCHE UNIVERSITAET GRAZ

 Organization address address: Rechbauerstrasse 12
city: GRAZ
postcode: 8010

contact info
Titolo: Mr.
Nome: Gerald
Cognome: Pichler
Email: send email
Telefono: 433169000000

AT (GRAZ) coordinator 75˙000.00

Mappa


 Word cloud

Esplora la "nuvola delle parole (Word Cloud) per avere un'idea di massima del progetto.

materials    patterning    films    solvents    generate    dimensionally    semiconductor    converted    cellulose    structured    tmsc    surfaces    nano    photon    industry    material   

 Obiettivo del progetto (Objective)

'While photolithographic techniques are well established for patterning of semiconductors, they have not been employed for polysaccharide based materials to a large extent. The main idea of this project is to generate nano-patterned cellulose thin films using ideas and concepts from semiconductor industry to create 2 and 3 dimensionally structured cellulose surfaces. As starting material for the generation of cellulose surfaces, trimethylsilyl cellulose (TMSC) containing (2-photon sensitive) photoacid generators (PAG) is used which is deposited on different kinds of surfaces by spin coating. The use of mask aligners and UV-light or 2-photon absorption lithography converts exposed areas to cellulose (silyl groups are cleaved off by the generated acid) while in the unexposed areas TMSC remains. After the patterning step, TMSC can be selectively dissolved using an appropriate solvent or, alternatively, the converted cellulose can be digested using cellulases. Using the latter route remaining TMSC can be converted to cellulose in an additional step. As a result, 2 and 3 dimensionally nanostructured films can be obtained which have a large potential as material for semiconductor industry, in medicine (for growth of stem cells, antifouling materials) and in optical materials (refractive index changes). While the main focus of the project is to generate nano-structured cellulose films, this approach can be easily extended to other polysaccharides as well. The whole project aims at reducing organic solvents and to use mainly so-called eco-solvents.'

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