Coordinatore | SCL-SENSOR.TECH. FABRICATION GMBH
Organization address
address: Seestadtstrasse 27/27 contact info |
Nazionalità Coordinatore | Austria [AT] |
Totale costo | 1˙427˙106 € |
EC contributo | 867˙156 € |
Programma | FP7-SME
Specific Programme "Capacities": Research for the benefit of SMEs |
Code Call | FP7-SME-2013 |
Funding Scheme | CP |
Anno di inizio | 2013 |
Periodo (anno-mese-giorno) | 2013-10-01 - 2015-09-30 |
# | ||||
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1 |
SCL-SENSOR.TECH. FABRICATION GMBH
Organization address
address: Seestadtstrasse 27/27 contact info |
AT (WIEN) | coordinator | 371˙860.00 |
2 |
AMG TECHNOLOGY OOD
Organization address
address: MICROELECTRONICA INDUSTRIAL ZONE contact info |
BG (BOTEVGRAD SOFIA) | participant | 248˙460.00 |
3 |
"NANOSCALE SYSTEMS, NANOSS GMBH"
Organization address
address: ROBERT-BOSCH-STRASSE 7 contact info |
DE (DARMSTADT) | participant | 246˙836.00 |
Esplora la "nuvola delle parole (Word Cloud) per avere un'idea di massima del progetto.
'Advances in micro-, nano-, and biotechnology put increasing demands on nanoscale microscopy and characterization. Atomic force microscopy (AFM) is one of the highest resolution microscopy methods used in this area. This project focuses on new sensor technology for the detection of the cantilever deflection for high-speed AFM cantilevers. This new technology allow the fabrication of much smaller, thinner and thereby faster cantilevers for high-speed AFM, and make them suitable for a much broader range of applications, especially in the life sciences. While traditional AFMs use optical detection of the cantilever sensor and yield very high resolution images, their imaging speed is low. They are difficult to automate and the integration into other analysis techniques is limited due to the required optical components. This project aims at removing these limitations for a large area of attractive AFM-applications such as fast analysis in materials science and biological applications. The innovative concept is based on 'Fast All-eLectric Cantilever for biO applicatioNs“ FALCON. The FALCON cantilevers will use novel granular tunnelling resistors (NTR), which are fabricated with a mask-less direct writing technique: focused electron-beam-induced deposition (FEBID). The AFM cantilever will be equipped with an NTR deflection sensor that directly measures the cantilever signal electrically, which removes the need for optical cantilever detection. Recent improvements in AFM cantilever technology have increased the imaging speed of AFM by up to two orders of magnitude by miniaturizing AFM cantilevers (SCL and AMG-T). The unique approach in this proposal, which builds on new materials and fabrication processes (NANOSS), will allow the manufacturing of unprecedented small cantilever sensors with vastly superior performance in imaging speed and usability. These cantilevers will be compatible with a wide variety of existing AFMs and applications in materials and life science.'
Atomic force microscopy (AFM) is one of the highest-resolution methods available for characterisation of materials at the nano-scale. To improve the resolution and diversify the functionality of AFM systems, new cantilevers are being pioneered, which promise to significantly enhance their capabilities.
AFM relies on detection of a minute deflection in a tiny cantilever equipped with a sharp tip as it passes over the surface of a sample to generate a 3D image with sub-nanometre resolution. Conventional AFM uses optical detection to measure the deflection of the cantilever by using a laser beam that is pointed at the back of the cantilever. It faces several limitations, including detection speed, automation capabilities and integration with other systems.
An international consortium is taking an all-electric cantilever to market with EU funding of the project 'Fast all-electric cantilever for bio-applications' (http://falcon.freesponsible.info/ (FALCON)). It promises to overcome all the limitations of optical detection in a big way by using a patented technology from the previous ALBICAN project exploiting nanogranular tunnelling resistors (NTRs) manufactured via focused electron beam-induced deposition.
During the first project period, the main focus other than technology transfer to the FALCON consortium was establishment of a fast and cost-effective manufacturing cycle for fully automated NTR deposition on wafer level. The team identified all necessary process steps for effective implementation. A first business plan for successful market introduction was delivered in this period and FALCON project was presented at several international conferences. The website is up and running, providing information to all stakeholders and the public on all relevant technologies and developments.
Next period, the team will conduct a performance verification of the NTR cantilever to ensure those large-scale processes deliver the same quality product as lab trials did. Development of a prototype upgrade module for existing AFM systems will ensure that AFM users do not have to scrap expensive existing systems to invest in something completely new.
All systems are go for the next project period, expected to demonstrate fabrication of small, self-sensing AFM cantilevers in a fully automated process on wafer level. The technology will enable a step change in performance compared to conventional cantilevers relying on optical detection. In addition, with elimination of the need for lasers, it also provides greater flexibility of use in a broader range of applications and by a broader user community. Especially the combination with other microscopy techniques, e.g. scanning electron microscopy, will allow correlated microscopy that enables unique characterization possibilities on the nanoscale.