SINANOTUNE

Dopant-surface interactions in silicon nanoclusters

 Coordinatore UNIVERSIDADE DE AVEIRO 

 Organization address address: CAMPO UNIVERSITARIO DE SANTIAGO
city: AVEIRO
postcode: 3810-193

contact info
Titolo: Dr.
Nome: Fernando
Cognome: Ferreira Batista
Email: send email
Telefono: +351 234 370 200
Fax: +351 234 370 090

 Nazionalità Coordinatore Portugal [PT]
 Totale costo 148˙283 €
 EC contributo 148˙283 €
 Programma FP7-PEOPLE
Specific programme "People" implementing the Seventh Framework Programme of the European Community for research, technological development and demonstration activities (2007 to 2013)
 Code Call FP7-PEOPLE-2009-IEF
 Funding Scheme MC-IEF
 Anno di inizio 2011
 Periodo (anno-mese-giorno) 2011-01-01   -   2012-12-31

 Partecipanti

# participant  country  role  EC contrib. [€] 
1    UNIVERSIDADE DE AVEIRO

 Organization address address: CAMPO UNIVERSITARIO DE SANTIAGO
city: AVEIRO
postcode: 3810-193

contact info
Titolo: Dr.
Nome: Fernando
Cognome: Ferreira Batista
Email: send email
Telefono: +351 234 370 200
Fax: +351 234 370 090

PT (AVEIRO) coordinator 148˙283.60

Mappa


 Word cloud

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   silicon    doping    dopant       surface    materials   

 Obiettivo del progetto (Objective)

'Silicon nanostructured films are promising materials for photovoltaic applications. By exploring confinement effects and changing the surface morphology, it is possible to vary the optical absorption threshold energy without the resource to different semiconductors. However, to exploit the potential of this class of materials, it is necessary to achieve a detailed understanding and control of n- and p-type doping. Here, a study of the interaction of dopant atoms with the surface of stand-alone silicon clusters is proposed. The investigation will be carried out using density functional theory electronic structure calculations, and observable properties will be applied to the interpretation of experimental results. The aim is to find the combination of dopant species, surface passivation and post-processing treatments that leads to optimum n- and p-type doping efficiency.'

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