2D-NANOLATTICES

Strongly anisotropic Graphite-like semiconductor/dielectric 2D nanolattices

 Coordinatore  

 Organization address address: Patriarchou Gregoriou Str.
city: AGHIA PARASKEVI
postcode: 15310

contact info
Titolo: Mrs.
Nome: Marina
Cognome: Fontara
Email: send email
Telefono: +30 210 6503037
Fax: +30 210 6532122

 Nazionalità Coordinatore Non specificata
 Totale costo 227 €
 EC contributo 0 €
 Programma FP7-ICT
Specific Programme "Cooperation": Information and communication technologies
 Anno di inizio 2011
 Periodo (anno-mese-giorno) 2011-06-01   -   2014-08-31

 Partecipanti

# participant  country  role  EC contrib. [€] 
1    NATIONAL CENTER FOR SCIENTIFIC RESEARCH "DEMOKRITOS"

 Organization address address: Patriarchou Gregoriou Str.
city: AGHIA PARASKEVI
postcode: 15310

contact info
Titolo: Mrs.
Nome: Marina
Cognome: Fontara
Email: send email
Telefono: +30 210 6503037
Fax: +30 210 6532122

EL (AGHIA PARASKEVI) coordinator 0.00
2    CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE

 Organization address address: Rue Michel -Ange 3
city: PARIS
postcode: 75794

contact info
Titolo: Ms.
Nome: Béatrice
Cognome: SAINT-CRICQ
Email: send email
Telefono: +33 4 91164008
Fax: +33 4 91779304

FR (PARIS) participant 0.00
3    CONSIGLIO NAZIONALE DELLE RICERCHE

 Organization address address: PIAZZALE ALDO MORO 7
city: ROMA
postcode: 185

contact info
Titolo: Dr.
Nome: Anna Maria Luisa
Cognome: Grazioli
Email: send email
Telefono: +39 039 6035235
Fax: +39 039 6881175

IT (ROMA) participant 0.00
4    INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM VZW

 Organization address address: Kapeldreef 75
city: LEUVEN
postcode: 3001

contact info
Titolo: Ms.
Nome: Christine
Cognome: Van Houtven
Email: send email
Telefono: 3216281613
Fax: 3216281812

BE (LEUVEN) participant 0.00
5    KATHOLIEKE UNIVERSITEIT LEUVEN

 Organization address address: Oude Markt 13
city: LEUVEN
postcode: 3000

contact info
Titolo: Ms.
Nome: Monique
Cognome: Vanhaeren
Email: send email
Telefono: +32 16 32 95 61
Fax: +32 16 32 65 15

BE (LEUVEN) participant 0.00
6    UNIVERSITE D'AIX MARSEILLE

 Organization address address: Boulevard Charles Livon 58
city: Marseille
postcode: 13284

contact info
Titolo: Ms.
Nome: Celine
Cognome: DAMON
Email: send email
Telefono: +33 4 91998595

FR (Marseille) participant 0.00

Mappa


 Word cloud

Esplora la "nuvola delle parole (Word Cloud) per avere un'idea di massima del progetto.

time    silicene    direction    hybridized    physical    equivalent    semiconductors    vertical    si    sp    gate    offer    layers    graphene    germanene    ge    nanolattices    dielectrics   

 Obiettivo del progetto (Objective)

Graphite-like 2D nanolattices of dielectrics and semiconductors with enhanced anisotropic electronic properties are good candidates to pave the way to the ultimate scaling and performances of future nanoelectronic devices. Graphene, the most studied representative of the 2D graphitic materials, has overshadowed research on other potential 2D nanolattices with totally unexplored physical properties. One such 2D lattice, silicene (germanene), the Si (Ge) sp2-hybridized equivalent of graphene, if it exists, may offer better compatibility with silicon processing and may provide solutions for some of the problems of graphene associated with the lack of an energy gap. In this proposal we will focus on finding ways to induce and stabilize sp2 hybridization in Si and Ge and prove for the first time that silicene has a physical existence. This should be combined with similarly sp2-hybridized dielectrics which could offer a template for silicene and germanene growth and, at the same time, serve as gate insulators which are necessary for charge and current control in the 2D semiconductors. The ideal situation would be to obtain a sequence of sp2-hybridized dielectric/silicene alternating monolayers which are weakly bonded between each other in the vertical direction via van der Waals forces. A strong anisotropy could also be induced by regular sp3-hybridized ultrathin Si and Ge in which the periodicity along the vertical growth direction is artificially broken by the insertion of monolayer-thick non- semiconducting layers. In such a case, the bandstructure and the density of states could be strongly modified reducing in-plane effective mass while inhibiting the transport perpendicular to the layers. This could reduce gate leakage and carrier scattering, thus maintaining high mobility at low equivalent oxide thickness.

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