M&M´S

New Paradigms for MEMS & NEMS Integration

 Coordinatore KUNGLIGA TEKNISKA HOEGSKOLAN 

Spiacenti, non ci sono informazioni su questo coordinatore. Contattare Fabio per maggiori infomrazioni, grazie.

 Nazionalità Coordinatore Sweden [SE]
 Totale costo 1˙495˙982 €
 EC contributo 1˙495˙982 €
 Programma FP7-IDEAS-ERC
Specific programme: "Ideas" implementing the Seventh Framework Programme of the European Community for research, technological development and demonstration activities (2007 to 2013)
 Code Call ERC-2011-StG_20101014
 Funding Scheme ERC-SG
 Anno di inizio 2011
 Periodo (anno-mese-giorno) 2011-11-01   -   2016-10-31

 Partecipanti

# participant  country  role  EC contrib. [€] 
1    KUNGLIGA TEKNISKA HOEGSKOLAN

 Organization address address: Valhallavaegen 79
city: STOCKHOLM
postcode: 10044

contact info
Titolo: Ms.
Nome: Erika
Cognome: Appel
Email: send email
Telefono: 4687907786
Fax: 468100858

SE (STOCKHOLM) hostInstitution 1˙495˙982.00
2    KUNGLIGA TEKNISKA HOEGSKOLAN

 Organization address address: Valhallavaegen 79
city: STOCKHOLM
postcode: 10044

contact info
Titolo: Prof.
Nome: Frank
Cognome: Niklaus
Email: send email
Telefono: 46762167349
Fax: 468100858

SE (STOCKHOLM) hostInstitution 1˙495˙982.00

Mappa


 Word cloud

Esplora la "nuvola delle parole (Word Cloud) per avere un'idea di massima del progetto.

nems    standardized    wafers    wafer    micro    mems    industry    heterogeneous    manufacturing    volumes    integration    explore    wire    ways    technologies    mono    crystalline    silicon    materials    ic   

 Obiettivo del progetto (Objective)

'Micro- and nanoelectromechanical system (MEMS and NEMS) components are vital for many industrial and consumer products such as airbag systems in cars and motion controls in mobile phones, and many of these MEMS and NEMS enabled applications have a large impact on European industry and society. However, the potential of MEMS and NEMS is being critically hampered by their dependence on integrated circuit (IC) manufacturing technologies. Most micro- and nano-manufacturing methods have been developed by the IC industry and are characterized by highly standardized manufacturing processes that are adapted for extremely large production volumes of more than 10.000 wafers per month. In contrast, the vast majority of MEMS and NEMS applications only demands production volumes of less than 100 wafers per month in combination with different non-standardized manufacturing and integration processes for each product. If a much wider variety of diverse and even low-volume MEMS and NEMS products shall be exploited, the semiconductor manufacturing paradigm has to be broken. In this project, we therefore will focus on frontier research on new paradigms for flexible and cost-efficient manufacturing and integration of MEMS and NEMS within three related research areas: (1) Wafer-Level Heterogeneous Integration for MEMS and NEMS, where we explore new and improved wafer-level heterogeneous integration technologies for MEMS and NEMS devices; (2) Integration of Materials into MEMS Using High-Speed Wire Bonding Tools, where we explore new ways of integrating various types of wire materials into MEMS devices; (3) Free-Form 3D Printing of Mono-Crystalline Silicon Micro- and Nanostructures, where we explore entirely novel ways of implementing mono-crystalline silicon MEMS and NEMS structures that can be arbitrarily shaped.'

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