CATHERINE
Carbon nAnotube Technology for High-speed nExt-geneRation nano-InterconNEcts
| Coordinatore | CONSORZIO SAPIENZA INNOVAZIONE
Organization address
address: VIALE REGINA ELENA 291 contact info |
| Nazionalità Coordinatore | Italy [IT] |
| Totale costo | 3˙489˙894 € |
| EC contributo | 2˙649˙999 € |
| Programma | FP7-ICT
Specific Programme "Cooperation": Information and communication technologies |
| Code Call | FP7-ICT-2007-1 |
| Funding Scheme | CP |
| Anno di inizio | 2008 |
| Periodo (anno-mese-giorno) | 2008-01-01 - 2010-12-31 |
Partecipanti
| # | ||||
|---|---|---|---|---|
| 1 |
CONSORZIO SAPIENZA INNOVAZIONE
Organization address
address: VIALE REGINA ELENA 291 contact info |
IT (ROMA) | coordinator | 0.00 |
| 2 |
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE
Organization address
address: Rue Michel -Ange contact info |
FR (PARIS) | participant | 0.00 |
| 3 |
INSTITUTUL NATIONAL DE CERCETAREDEZVOLTARE PENTRU MICROTEHNOLOGIE
Organization address
address: Erou iancu Nicolae Street contact info |
RO (VOLUNTARI, BUCHAREST) | participant | 0.00 |
| 4 |
ISTITUTO NAZIONALE DI FISICA NUCLEARE
Organization address
address: Via Enrico Fermi contact info |
IT (FRASCATI) | participant | 0.00 |
| 5 |
LATVIJAS UNIVERSITATES CIETVIELU FIZIKAS INSTITUTS
Organization address
address: KENGARAGA IELA contact info |
LV (RIGA) | participant | 0.00 |
| 6 |
PHILIPS ELECTRONICS NEDERLAND B.V.
Organization address
address: Boschdijk contact info |
NL (EINDHOVEN) | participant | 0.00 |
| 7 |
SMOLTEK AB
Organization address
address: STENA CENTER 1D contact info |
SE (GOTEBORG) | participant | 0.00 |
| 8 |
TECHNISCHE UNIVERSITEIT DELFT
Organization address
address: Stevinweg contact info |
NL (DELFT) | participant | 0.00 |
| 9 |
TOTALFORSVARETS FORSKNINGSINSTITUT
Organization address
address: Gullfossgatan contact info |
SE (STOCKHOLM) | participant | 0.00 |
| 10 |
UNIVERSITA DEGLI STUDI DI ROMA LA SAPIENZA
Organization address
address: Piazzale Aldo Moro contact info |
IT (ROMA) | participant | 0.00 |
| 11 |
UNIVERSITA DEGLI STUDI DI SALERNO
Organization address
address: VIA PONTE DON MELILLO contact info |
IT (FISCIANO (SA)) | participant | 0.00 |
| 12 |
UNIVERSITE PAUL SABATIER TOULOUSE III
Organization address
address: ROUTE DE NARBONNE contact info |
FR (TOULOUSE CEDEX 9) | participant | 0.00 |
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Obiettivo del progetto (Objective)
CATHERINE will provide a new unconventional concept for local and chip-level interconnects that will bridge ICT beyond the limits of CMOS technology.
The main goals of CATHERINE are:
G1) to develop an innovative cost-effective and reliable technological solution for high-performance next-generation nanointerconnects.
G2) to develop proof-of-concept nanointerconnects to assess and verify the new proposed solution
The expected results of CATHERINE are then summarized by the following points:
R1) definition of all causal relations within the design-chain 'microstructure characteristics – fabrication process – functional properties'
R2) development of multiscale multiphysics simulation models for the prediction of the multifunctional performance of the interconnect and for the EMC analysis
R3) development of electromagnetic and multifunctional test procedures and experimental characterization methods
R4) manufacturing and testing of proof-of-concept samples of nanointerconnects at laboratory level.
The final project product will be:
P1) integrated data-base for nanointerconnect design
P2) proof-of-concept nanointerconnect
The new bottom-up approach proposed by CATHERINE consists in realizing CNT-based nano-interconnects for integrated circuit exploiting two different techniques: (i) a template-based CVD technique that allow high control of the growth of perfect aligned arrays of CNTs. The CNTs are synthesized within the pores of properly designed alumina nanostructures. CNTs wall thickness is controlled by the reaction time, the CNT length by the thickness of alumina nanostructures, the CNT external tube diameter by the nanostructures pore size; (ii) CVD growth of CNTs and carbon nanofibers (CNFs) on substrate patterned with nano-imprint lithography. Both techniques do not require electron beam lithography (EBL) for CNTs growth or substrate preparation. The resulting process is cost-effective and can be easily implemented at industrial scale.